Public tenders for industrial in Bonn Germany

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Industrial kitchen equipment

Bundesstadt Bonn, Referat Vergabedienste | Published August 9, 2016  -  Deadline September 20, 2016
cpvs

Industrial kitchen equipment

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published September 1, 2015
cpvs
42000000

Industrielle Maschinen

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published April 15, 2017  -  Deadline May 14, 2017
cpvs
42000000

Inductively Coupled Plasma (ICP) etching system with vacuum lock

is to be procured a tested system, which is among others suitable for nanostructuring of III-V compound semiconductors.

be optimized 50 mm diameter.

The system shall be within RIE fashion and fashion can be operated in ICP.

Substrate electrode suitable for fragments and up to 200 mm wafer (without tags)

Electrode temperature can be (-30 to + 80 ° C)

System footprint <= 170 cm x 65 cm

The offer should include:

vacuum system

8 MFC-controlled gas lines

vacuum lock

Laser interferometer for endpoint recognition

Control via software

Others

The system must comply with the relevant current regulations, certifications and standards

The manufacturer should be able to guarantee good conduct process support

Implied warranties

Free delivery to location.

Inductively Coupled Plasma (ICP) etching system with vacuum lock

is to be procured a tested system, which is among others suitable for nanostructuring of III-V compound semiconductors

process chamber

Aluminum chamber by milling a solid aluminum block

Pump flange> = 200 mm for very high effective pumping speed

> = 40 mm flange with window + additional lateral port.

Plasma source and pumping system fully radially symmetrical to ensure best uniformity over a wide range of parameters.

ICP plasma chamber inner diameter of 50-80 mm.

80 ° C

Substrate electrode

> = 200 mm, suitable for fragments and up to 200 mm wafers

Helium backside cooling (software controlled) with mechanical clamping

Clamping device for wafers (2 ") included

Electrode temperature regulated (under software control) in the range -30 to + 80 ° C

Carrier

The processing of substrates up to 200 mm diameter and debris must be possible without tags.

plasma sources

Substrate electrode

Power 300 W, 13.56 MHz

Aluminum dark space shield at ground potential

50 mm diameter

ICP type: helical

without capacitive component ie with (removable) electrostatic shield

ICP-Ceramics: Alumina

The system must be able to operate without mechanical changes in RIE mode and in ICP mode.

Power> 600 W (13.56MHz)

Both units for automatic frequency tuning (AMU) must have two controlled stepper motors vacuum capacity.

Reflected power <2% of forward power

Substrate electrode may be coupled.

vacuum system

Turbomolecular pump suitable type

Electric heating of the pump nozzle

Please offer as an option: dry-running pump suitable type (reactive gas resistant with N2 purge) and suction

8 MFC-controlled gas lines

5 MFC-controlled gas lines, 2 of which bypass and internally sealed metal MFC, one of them electrically heated

electropolished gas lines inside and outside and orbital welded, screwed only VCR

vacuum lock

Vacuum lock with a small volume <6 liters

30 cm x 50 cm

Aluminum chamber by milling a solid aluminum block

200 mm diameter)

Inter Chamber valve VAT MONOVAT

70 l / s suction capacity

Own dry pump with> = 15 m 3 / H

Pirani and Penning tubes for vacuum measurement

laser interferometer

Derivative, manual x / y table (drive range 10 mm in x and 10 mm in the y direction), built-in camera)

control Panel

The complete plant is from a PC (Preferred Operating system: Windows 10) are controlled

MESC

The system must meet the MESC standard.

The system should match the 200 mm SEMI-MESC standard.

Safety, CE

The system must meet the currently valid CE standards, in particular

EN13849

Machinery Directive - 2006/42 / EC

Low Voltage Directive - 2006/95 / EC

EMC Directive 2004/108 / EC

environment

Detection of environmental measures, for example the ISO 14001: 2004 certification

Dimensions

System footprint <= 170 cm x 65 cm

(Without backing pumps, PC, heater / chiller, Gas Pod)

Others

3 days before arrival) to process evidence and Training

Local service

12 months warranty Free delivery to location.

Industrial clothing

Beschaffungsamt des Bundesministeriums des Innern | Published March 25, 2017  -  Deadline May 4, 2017
cpvs
18113000

Mechanic suits, consisting of trousers and jacket, two-tone, in the version for men and women.

Industrial clothing

Beschaffungsamt des BMI | Published December 30, 2015  -  Deadline March 16, 2016
cpvs
18113000

Weather protection clothing THW consisting of jacket and pants, bright orange.

Industrial clothing

Beschaffungsamt des BMI | Published March 10, 2015  -  Deadline April 29, 2015
cpvs
18113000

Multipurpose suits BPOL.

Industrial clothing

Beschaffungsamt des BMI | Published February 26, 2015  -  Deadline May 21, 2015
cpvs
18113000

Use jackets and pants, blue, flame retardant, BPOL.

Industrial kitchen equipment

Bundesstadt Bonn, Referat Vergabedienste | Published December 23, 2016
Winner
Brockhagen Großküchentechnik
cpvs
39314000

SGB ​​230,988th

The kitchen to be offered technical device basically consists of the following services:

1 St. Abräumstation with pre-wash;

1 St. Box through dishwasher with hood;

1 St. coldstore 2.1 x 4.8 m with shelves;

4 St. refrigerators;

2 St. steamer oven with hood;

3 St. Food serving warm, 4 GN;

3 St. Plate dispenser car;

1 St. essay refrigerated display case;

3 St. worktables;

7 St. Trolley;

1 St. wet waste cooler.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published September 16, 2016
Winner
GE Machining Solutions GmbH
cpvs
42000000

Procurement of a surface machining center in the tender notice unspecified features and technical equipment for the TU Dresden.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published August 23, 2016  -  Deadline September 18, 2016
cpvs

For the planned analyzes a micro-computerized tomography measurement system to at least the following properties are procured comprising:

- Radiological protection unit;

- Nominal resolution <1 micron;

- Resolution (10% MTF) <2 microns;

. - Size scannable object: at least 50 x 120 mm (diameter x height);

- Automatic sample changer for a minimum of 12 samples for batch processing with Scout-view function;

- Integrated HA Phantom for density calibration;

- Automatic filter changer for use of different filters (aluminum / copper);

- Optimized on bone analysis software;

Minimum requirements for the software:

2D / 3D reconstruction;

Integrated database for sample handling;

Data management (archiving / backup / initialize the backup media);

Automated analysis;

2D / 3D analysis (dimensions, surfaces, density, histomorphometry (TBN, TbTh, BV / TV, tbsp, Connectivity, anisotropy) of regular and irregular ROIs contact zone);

Volumetric rendering;

Web-Based Access.

- Export function of 3D data;

- Data backup system with at least 10 TB RAID 5 plus additional assurance system (eg LTO tape drive SAS Ultrium. 5);

- Workstation for scanning and analysis; (eg hp Integrity rx2800 Server 4Kerne 64GB Ram including monitor and operating system.)

- Documentation, delivery, installation, 3 days of training and 12 months Service.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published June 15, 2016
Winner
M. Braun Inertgas-Systeme GmbH
cpvs
42000000

Procurement of a layer deposition system in the tender notice unspecified features and technical equipment for the Karlsruhe Institute of Technology (KIT) in Karlsruhe.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published November 24, 2015  -  Deadline December 21, 2015
cpvs
42000000

What is needed is a thermal evaporator, the organic and inorganic materials on an area of ​​up to 4 x 4 "with a layer thickness accuracy less or equal to 5% may be vapor-deposited. In addition, the evaporator is to be coupled to a large glove box with 4-operator connections. Low temperature sources of organic materials shall be 1cc in size and the source body is via plug-in connection, rather than firmly bolted connections, may be secured to facilitate the sharing of resources. Controlling the evaporation of organic materials should be with an accuracy of up to 0,001 nm / sec are possible. 4 metallic and 2 organic sources with each individual coating thickness gauges are needed. The substrate should be able to rotate during the deposition process. The evaporation chamber is made of stainless steel and an interchangeable inner lining. Through these structural measures on the one hand contamination and corrosion are prevented and, secondly, a fast and reliable cleaning can be ensured. In addition, the door of the evaporation chamber should have a concealable inside window. All required pumps should be mitinbegriffen and a working pressure of at least 2 x 10-7 mbar can be reached within a reasonable time. Evaporation of the materials should be able to also be automated. The glovebox should have an atmosphere with less than 1 ppm O2 and H2O to protect reactive and water-sensitive materials. The front slip the glove box should default made of safety glass. Furthermore, the glovebox should have a "quick rinse" have to be able to maintain in their contained atmosphere. Furthermore, a local customer support and technical service is desirable.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published September 15, 2015
Winner
Oxford Instruments GmbH
cpvs
42000000

Procurement of a plasma etching system with in the contract notice unspecified features and technical equipment for the University of Würzburg.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published February 18, 2015
Winner
Zwick GmbH & Co. KG
cpvs
42000000

Procurement of a torsion with in the contract notice unspecified features and technical equipment for the TU Chemnitz.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published May 2, 2015  -  Deadline May 28, 2015
cpvs
42000000

General requirements: - RIE ICP facility as a complete system, including all components needed for correct operation; - The plant is (x 1 cm2 substrate surface in the region 1) be be optimized and also for substrates up to 2 "diameter for small substrates; - The system must be usable as RIE (without ICP); An exchange between fluorine-containing and chlorine-containing gases must at all times be possible without replacing or changes of system components; - The homogeneity of the etching processes (homogeneity = ([max] - [min]) / (2 [medium]) - 100%) in an area with a diameter of 2 "must be at least ± 5% or better; - The equipment must be suitable for the use of metallic, semiconducting and insulating samples; - The working pressure must be adjusted at least in the range of 2-10-3 1-10-1 mbar to mbar; Vacuum system); Options), the other systems are not to be offered; - The system must be designed and suitable for use in a clean room. Vacuum system (process chamber) - Material: aluminum, made from a solid aluminum block, with at least one viewing window for process monitoring; - Connected via a VAT-valve with a lock chamber (vacuum lock); The diameter of the carrier wafer is to be 4 "; - Base pressure in the process chamber below 2 - 10-6 mbar; - To allow a user-side expansion of the system has the processing chamber side, at the height of the substrate, at least one additional flange having a size of at least DN63 and maximum DN100 have (the flange has at delivery be blanked off and required for any other purpose are ). About this flange, an alternative sample transfer in the chamber can be (not including transfer concept.) Must be possible; As a backing pump to a dry compressing or oil-sealed (Fomblin) backing pump can be used with a pumping speed of 25 m3 / h; - Including electric Kammern- and pump nozzle heater; - Measurement of the vacuum of the base pressure and the inlet pressure of the turbo-molecular pump; Pressure control over entire working pressure range in the process chamber; - Automatic VAT butterfly valve for regulating the pump power; - Vacuum chamber and conditioning electronics integrated compactly into a frame, any existing panels to be easily removable for maintenance purposes, backing pumps and gas cabinets can be located outside of the frame; Options). Including lock chamber vacuum measurement and inspection window; - Base pressure in the lock chamber after five minutes pump below 2 - 10-4 mbar; - Turbo molecular pump with a pumping speed of at least 65 l / s (N2) and a dry compressing backing pump with a Sauvermögen of at least 13 m3 / h. RIE substrate electrode - RIE substrate electrode having a diameter of at least 160 mm; The electrodes reach temperatures must also be possible as a continuous operation; The temperature control must be carried out on the system software; - Thermostat to control the temperature of the substrate electrode included; The helium pressure is to be specified as a parameter and measured and controlled by varying the flow; The starting positions of the capacity of the tuning unit must be additionally specified as process parameters. ICP source - ICP source in helischer (cylindrical) shape; - The ICP source must have a removable electrostatic shield; General requirements specified substrate sizes are sufficiently large, but at least be 65 mm; - The ICP source has to be like all the other components of the system for the use of inert, fluorine-containing and chlorine-containing process gases suitable; The starting positions of the capacity of the tuning unit must be additionally specified as process parameters; - RF power must be sufficient to achieve a plasma density of at least 11 ^ 5-10 1 / cm3 to achieve; - In the process, the specification of the bias voltage must be possible. Gas supply - flushable and sealable gas cabinet, designed for a total of at least 12 gas lines, of which at least 7 installed gas lines, gas lines need to be further upgraded gas lines electropolished and orbital welded; Input particle filter; - The individual gas lines should be interrupted by controlled valves and the gas flow controlled by calibrated MKS mass flow controller (MFC) (N2, O2, H2, CF4, CHF3, Ar, Cl2); - At least two installed gas lines must have a metal sealed MFC and a bypass (for corrosive or toxic gases) feature; - Gas distribution stainless steel VCR fittings in the gas cabinet. A plant control PC for system control with all necessary components are included; Sample transfer) and also allow manual control of the system; B. in csv format) ABG

Industrial quality control services

Bundesministerium für wirtschaftliche Zusammenarbeit und Entwicklung (BMZ) | Published April 14, 2017  -  Deadline May 22, 2017
cpvs
71731000, 79419000, 72225000

Subject of the tender is to carry out performance of the external quality control in the state implementing organization GIZ GmbH.

Industrial quality control services

Bundesministerium für wirtschaftliche Zusammenarbeit und Entwicklung (BMZ) | Published May 19, 2017  -  Deadline June 7, 2017
cpvs
71731000, 79419000, 72225000

The object of the call for tenders is to carry out external quality control measures at the state implementing organization GIZ GmbH.

Industrial kitchen equipment

Bundesstadt Bonn, Referat Vergabedienste | Published January 8, 2016
Winner
GKT Bergisch-Land GmbH
cpvs
39314000, 39221000

Supply and installation of a Mesnaküche for the new Marie-Kahle Comprehensive School; Distribution kitchen with food distribution; 1 piece warm kitchen with combi steamer and stainless steel furniture; 1 piece Cold combination with refrigeration; 2 pieces hot / cold expenditure; Mobile equipment and installation donors.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published August 17, 2016
Winner
Createc Fischer &amp; Co. GmbH
cpvs

Procurement of a LT-STM / AFM system in the tender notice unspecified features and technical equipment for the RWTH Aachen.

Industrial machinery

Deutsche Forschungsgemeinschaft e. V., Zentrale Beschaffungsstelle | Published November 13, 2015
Winner
AneCom AeroTest GmbH
cpvs
42000000

Procurement of a detailed design, recalculation and manufacturing a compressor shaft and two Verdichterblisks with in the contract notice unspecified characteristics and technical features.