The Fraunhofer Institute for Applied Optics and Precision Engineering (IOF) in Jena, Germany is planning a new (modified chemical vapor deposition) MCVD system to install for the production of preforms, which are doped with active or passive ion. The entire system, consisting of glass working lathe and chemical peripherals for the MCVD process should be cost-effective and compact.
Fraunhofer IZM want to obtain a device for the qualitative and quantitative analysis of surfaces. The desired analytical method is commonly referred to by ESCA (Electron Spectroscopy for Chemical Analysis) or XPS (X-ray Photoelectron Spectroscopy). among others, since even the smallest sample geometries are to be examined, the system needs to analyze each management unit enable (Small spot ESCA System). Continued II.2.4.
Complementing II.1.4) Further circulation fixtures and expansion options in the system are also advantageous and desirable, such. As AES, SEM, SAM, UPS, ISS (or comparable measuring systems), Monochromatic dual excitation, gas cluster ion source, fridge and heating option, system introduction of samples of air. Special features: The installation of the system is limited and will be announced with the invitation to tender. If an electromagnetic site neutralization and / or floor vibration damping is required, they must be delivered by the contractor in an appropriate design.
Inorganic precipitant for phosphate removal.
Supply of inorganic precipitant for phosphorus removal
- About 34,200 kmol precipitant WS (2 years required); the sewage treatment plant Gut Großlappen liquid products can be used in mole with a proportion of Fe 2+ or Fe 3+ between 20% and 45% of the total active substance content (WS).
- About 6600 kmol aluminum chloride solution WS (Al) (2 years required) - active substance min .: 2.2 mol Al / kg.
As part of the strategic investment "Bioplasmalabor" is an AFM Raman spectrometer to be purchased. For biological applications, the chemical characterization of molecules on the surface is critical to the understanding of reactivity and function.
Wet chemical cleaning and Ätzbank for thick and thinned SiC wafer.
The production of power devices on SiC wafer by almost every manufacturing process step, a wet chemical cleaning is necessary. This is normally done in cleaning benches, in which up to 25 wafers can be simultaneously cleaned. After certain manufacturing process steps, it is better to perform a single-wafer cleaning. For this purpose the following equipment is required: single-wafer system for SiC wafers with 100 and 150mm (expandable to 200 mm) and for 9 "square substrates for wet chemical cleaning; chemical supply (TMAH and H2SO4) by pressure tanks, Manual filling, CO2 Bubbler, preheating H2SO4 at 70 ° C, pre-heating of DI water at 70 ° C, automatic Spüllung and neutralization of the cleaning chamber, easier Chuck exchange, cleanroom compatibility, computer controlled, CE marking.
For the production of low-resistance SiC wafer on the metal is nickel or nickel compounds is needed. Since this metal is neither wet nor dry chemical chemically to structure well, used for patterning this metal called lift-off process. In this process, the metal is applied to a patterned photoresist layer and subsequently the photoresist is removed and so that the part of the nickel layer which was deposited onto the patterned photoresist. For this purpose a system is needed, with which this is carried out without problems.
Single-wafer system for SiC wafers with 100 and 150mm (expandable to 200 mm); Use of environmentally friendly solvents, high pressure pump for the solvent recirculation and filtration of the solvent, the temperature of the solvent, cleanroom compatibility, computer controlled, CE marking.
New building, research building, 4 single building (office, chemical building, workshop and test hall, ELMI-building) in two phases at the Max Planck Institute for Chemical Energy Conversion with a gross floor area of approximately 11,750 m
Site equipment, Shell, roof sealing, facade / sun protection, scaffolding, Schlosser 1, drywall / interior doors, flooring / coating, steel and glass doors, sheet steel doors, flooring tiles, floor covering PVC, flooring parquet, painting work, Schlosser 2, metal, Carpenter / loose furniture, blackout / glare protection, locking system, signage, cleaning, installation of heating / ventilation / air conditioning systems, plumbing, electrical installation, laboratory furniture, landscaping work.
For the processing of glass tubes and glass rods made of quartz glass apparatus for homogeneous surface cleaning and treatment with hydrofluoric acid is wanted. At the same time an air cleaner, for the elimination of contamination in the air, a work in Digestorienbauweise with 2 pools is for manual etching with hydrofluoric acid, and sought a solution for the collection of contaminated process water. The chemical supply of the device for the homogeneous surface treatment and the Digestoriums to be solved via a common supply station.
Transportable methanol plant, capable of producing methanol from CO and CO2 with the aid of H2 in chemical-catalytic synthesis process. The facility will serve for research purposes as a demonstration plant. They intended to simulate a large-scale implementation and is initially operated with a variable mixture of pure cylinder gases and later with real cottage exhaust gases of a steel mill in Germany. For economic reasons, a used methanol plant is to be procured.